외국인통합사이트

2025 Ajou International Summer Program 'AISS' and 'ABC' has officially started!

AISS orientation was held on July 1 at Yeonam Hall, Students overview of the program and interact exchange sessions ABC orientation was held on July 2 at Yulgok Hall. Various program-related information and guidance were provided Ajou University has started its international exchange programs for foreign students: the 2025 Ajou International Summer School (AISS) and the Ajou Bespoke College (ABC) program. The AISS started off on July 1 in Yeonam Hall with an orientation and began its three-week academic session. A total of 64 students from 10 universities across eight countries—including Germany, Lithuania, the Netherlands, France, Spain, Austria, Uzbekistan, and Indonesia—are participating. Among them, 29 students are from Ajou University at Tashkent(AUT). During the program, participants will choose two out of five courses—Data Analysis & Business Decision-Making, Macroeconomic Development, Understanding Korean Culture, Sustainability, and Korean Language—to earn six credits. Beyond academics, students will experience K‑POP dance classes, traditional food experiences, visits to Bukchon Hanok Village, visits to Samsung Innovation Museum, Suwon Hwaseong Haenggung, Suwon Media Center, and more. The ABC program began its orientation on July 2 at Yulgok Hall and runs for 14 days until July 15. This year’s includes 19 students from top U.S. universities—University of Wisconsin, USC, University of South Florida, UNLV, UC San Diego—as well as 10 Ajou University students. Centered on a capstone project led by Professor So Jae‑hyun (Construction & Transportation Engineering), the curriculum also features lectures on data analysis of Korea’s economic and cultural development (Prof. Yoon Cheon‑seok), the history and current state of Korean industry and entrepreneurial spirit (Prof. Kim Chan‑woo), the transformation from ancient to modern Korean history (Prof. Han Sang‑woo), and promoting historical content focusing on National Museum artifacts (Prof. Park Jae‑yeon) . Field trips include visits to Samsung Innovation Museum, Celltrion, DaeWoong, Dentium, Naver, the National Museum, Gyeonggi Provincial Assembly, a Han River cruise, and Suwon Hwaseong, giving participants diverse insights into Korean culture and history.

Prof. Ilkwon Oh’s Research Team Develops AS-ALD Technology for Semiconductor Miniaturization

- Area-Selective Atomic Layer Deposition (AS-ALD) Gains Attention as a Key Breakthrough Technology - Enables Patterning Without Exclusive 'EUV Equipment', Allowing for Customized Fabrication * Caption for the image above: An illustration showing the selective formation of red-colored aluminum oxide (Al₂O₃) only at the grain boundaries — the leakage current pathways — of zirconium dioxide (ZrO₂) through the new area-selective atomic layer deposition (AS-ALD) process developed by the Ajou University joint research team. This technology is expected to maximize storage capacity while minimizing data loss in DRAM devices. Professor Ilkwon Oh’s research team at Ajou University has developed a technology that enhances the precision of semiconductor processes through area-selective atomic layer deposition (AS-ALD). This advancement is expected to play a crucial role in the manufacturing of next-generation miniaturized and high-density semiconductor devices. Professor Ilkwon Oh (Department of Intelligent Semiconductor Engineering and Department of Electrical and Computer Engineering) and a joint research team from the Samsung Advanced Institute of Technology (SAIT) announced their successful development of an AS-ALD technology that can significantly improve the precision of thin film deposition in semiconductor fabrication. Their research was published in the April issue of Advanced Science under the title “Area-Selective Atomic Layer Deposition on Homogeneous Substrate for Next-Generation Electronic Devices.” Minjeong Lee, Byungjun Won, and Youngjin Lim (Master’s students from the Department of Intelligent Semiconductor Engineering at Ajou University) participated as co-first authors, and Professor Ilkwon Oh served as the corresponding author. Dr. Seonghyun Kim and Dr. Jungkyu Song from SAIT also contributed as co-authors. Area-Selective Atomic Layer Deposition (AS-ALD) is a process that enables deposition to occur only on specific areas of a semiconductor substrate. This technology allows precise application of desired materials to selected locations on the semiconductor surface. Traditional Atomic Layer Deposition (ALD), widely used in semiconductor processes, forms uniform thin films across the entire substrate. It has been a key technique in the manufacturing of memory devices such as DRAM and NAND flash, as well as non-memory (system) semiconductors. However, as semiconductor devices continue to shrink and become more densely integrated, there is an increasing demand for selective thin-film deposition to reduce process steps, lower manufacturing costs, minimize error rates, and improve precision and efficiency. Consequently, AS-ALD has emerged as a core next-generation semiconductor processing technology, attracting attention as a breakthrough solution capable of overcoming the technical limits currently facing the semiconductor industry. By employing AS-ALD, many conventional process steps can be eliminated, dramatically lowering manufacturing costs and the potential for errors. Additionally, AS-ALD enables semiconductor patterning without the need for expensive extreme ultraviolet (EUV) lithography equipment, which has been monopolized by certain companies, further intensifying industrial and academic interest. Furthermore, AS-ALD opens possibilities for customized fabrication of new types of three-dimensional micro-semiconductor devices that are difficult to achieve using traditional techniques and equipment. Despite these advantages, the implementation of AS-ALD in actual semiconductor mass production has faced significant challenges. Depending on the chemical materials and substrates used, maintaining precise selective deposition has been difficult, and electrical performance degradation has often been observed when applied to real devices. To overcome these limitations, the Ajou University research team targeted the widely used ZAZ (ZrO₂/Al₂O₃/ZrO₂) capacitor layer structure in DRAM processes. Specifically, they selectively deposited aluminum oxide (Al₂O₃) only at the grain boundaries—the paths where leakage currents typically occur—thereby minimizing unnecessary Al₂O₃ deposition and effectively improving device performance and reliability. * Transmission electron microscope (TEM) images and chemical composition analysis confirmed the selective formation of Al₂O₃ at grain boundaries. Graphs b and c illustrate the concentration of Al depending on the distance from the grain boundaries, verifying the selective deposition of Al₂O₃ at the desired locations. Using zirconium dioxide (ZrO₂) substrates, the research team experimentally analyzed and demonstrated the mechanisms for selective deposition, proving that selective control was feasible. They also confirmed that AS-ALD not only enhances semiconductor device performance but also significantly reduces unwanted leakage currents. This breakthrough suggests a method to maximize storage efficiency in DRAM devices and minimize data loss during device miniaturization, marking an important technical milestone for memory device advancement. Professor Ilkwon Oh stated, "While area-selective atomic layer deposition is essential for overcoming technological barriers in the semiconductor industry, there have been many challenges in applying it to real processes. Our research experimentally demonstrates that selective deposition and control are achievable, representing a significant advance in semiconductor processing technology." He added, "We will continue further research to enhance device performance and improve process efficiency for industrial applications." The Ajou University research team plans to pursue follow-up studies to develop more precise control techniques for atomic layer deposition processes and to explore their industrial applicability.

Prof. Taekwang Yoon’s Research Team Develops Eco-Friendly Additive to Enhance Performance and Lifespan of Supercapacitor

* In the photo above – from left: Professor Taekwang Yoon (Ajou University), Seonghun Lee (Ph.D. integrated program student, Ajou University), Ji-Young Park (Master’s student, Ajou University), and Hyungseob Yoon (Ph.D. integrated program student, Chung-Ang University). Professor Taekwang Yoon’s research team at Ajou University has developed a natural rubber-based electrolyte additive that dramatically improves the performance and lifespan of supercapacitors. By utilizing eco-friendly and cost-effective materials, this innovation is expected to become a significant milestone in securing the sustainability of supercapacitors, one of the leading high-performance energy storage technologies. Professor Taekwang Yoon (Department of Applied Chemistry and Graduate School of Molecular Science and Technology) and his team announced that they successfully enhanced the performance and durability of supercapacitors by developing a novel electrolyte additive based on biopolymers. Their research findings were published online in the April issue of Energy Storage Materials under the title, “Long-lasting supercapacitor with stable electrode-electrolyte interface enabled by a biopolymer conjugate electrolyte additive.” Professor Yoon served as the corresponding author, with Seonghun Lee (Ph.D. integrated program student at Ajou University), Ji-Young Park (Master’s student at Ajou University), and Hyungseob Yoon (Ph.D. integrated program student at Chung-Ang University) contributing as co-first authors. Supercapacitors are next-generation energy storage devices that offer significant advantages over conventional batteries. They do not use lithium (Li), making them environmentally friendly, and are capable of storing large amounts of electrical energy. With their ability for rapid charge and discharge cycles and their virtually unlimited lifespan, supercapacitors are increasingly seen as a viable alternative to traditional batteries. They are already being utilized as supplementary power sources in fields such as electric vehicles and renewable energy systems, and are expected to find even broader applications in the future. Unlike batteries, which rely on chemical reactions and ion diffusion to store energy, supercapacitors store energy through surface-controlled reactions at the electrode-electrolyte interface. Thus, the stability of this interface plays a critical role in determining the electrochemical performance of supercapacitors. Because of this, ensuring the stability of the electrode-electrolyte interface has been a key research focus for improving supercapacitor performance. Various approaches have been explored, such as ▲polymer coatings ▲the use of self-healing inks based on 3D printing ▲surface modification using atomic layer deposition (ALD) techniques. However, these methods have faced limitations regarding process complexity, environmental concerns, high costs, and scalability challenges for mass production. In particular, maintaining stable interface characteristics over long periods while preserving high power output remains a major challenge. Over time, the electrode-electrolyte interface tends to become unstable, leading to the accumulation of by-products and the deterioration of electrochemical performance. In response, the Ajou University research team set a goal to develop a high-performance system that meets the demands of long-term stability, reliable operation, and environmental sustainability. a. Schematic of the supercapacitor developed by Professor Taekwang Yoon’s team at Ajou University. b. Schematic illustration of the electrode structure. c. Schematic depiction of the electrolyte additive fabrication process. The additive, made from gum kondagogu (a by-product of natural rubber production) and sodium alginate(extracted from seaweed), is eco-friendly, cost-effective, and highly efficient. To solve the instability problem of the electrode-electrolyte interface in conventional supercapacitor systems, the Ajou University research team developed a conjugated KS (gum kondagogu/sodium alginate) additive using eco-friendly natural rubber-derived gum kondagogu and sodium alginate extracted from seaweed. This additive boasts excellent solubility in aqueous electrolytes, improving ion conductivity and mobility, resulting in significantly enhanced performance compared to traditional electrolytes. Notably, adding even a small amount of the KS additive to sulfuric acid (H₂SO₄)-based electrolytes substantially improved interface characteristics. After 30,000 charge-discharge cycles, the capacitance retention rate increased from 58% to 93%. This remarkable result was achieved because the protective layer formed on the electrode surface suppressed by-product generation and facilitated smooth ion and electron transport. Compared to conventional chemically synthesized electrolytes, the KS additive-based electrolyte offers simpler processing and lower costs, making it highly promising for industrial applications. Additionally, the KS additive, being a natural polysaccharide-based biopolymer, is abundant, recyclable, and inexpensive, providing excellent scalability for mass production and large-scale processing. The research team expects that this study will establish a core technology for next-generation eco-friendly energy storage devices. In particular, electrodes made from the same biopolymers as the additive exhibit excellent flexibility and are easily manufacturable on a large scale, making them applicable not only to wearable electronics but also to large-scale energy storage systems. Professor Taekwang Yoon stated, "Through this research, we have significantly improved the electrode-electrolyte interface stability of supercapacitors, developing an eco-friendly and industrially applicable energy storage technology," and added, "We plan to continue with follow-up research aimed at applications in various fields." This research was supported by the Ministry of Science and ICT, the National Research Foundation of Korea, the University of Glasgow Startup Fund, and the AMRITA Seed Grant. *An image showing the flexibility of the large-area KS/CNT electrode developed by the Ajou University research team. The electrode maintains its structural integrity without damage under various mechanical deformations, suggesting its potential application in energy storage systems for wearable electronic devices.

Meeting with the Minister of Education and International Students_Strengthening Universities' Global Competence

A roundtable meeting was held to discuss ways to enhance universities’ global competitiveness. Minister of Education Lee Ju-ho, Ajou University President Choi Ki-joo, and international students from Ajou University gathered to exchange ideas on the educational environment and conditions. Held on the afternoon of the 9th at Ajou University’s Yulgok Hall, thew meeting was attended by Minister Lee and officials from the Ministry of Education, President Choi and other Ajou University representatives, as well as nine international students currently enrolled at Ajou. National Assembly member Kim Jun-hyuck and Han Sang-shin, President of the National Institute for International Education, were also present. Lee Seok-Won, Vice President for International Affairs, delivered a presentation on the theme of “Strategies to Strengthen Universities’ Global Competitiveness,” followed by a session to hear the reflections and suggestions of the international students. A free discussion among the attendees followed. The event was organized to hear firsthand opinions from international students studying in Korea. The goal is to contribute to the regional development through the recruitment, nurturing, and settlement support of outstanding international students, while enhancing the global competitiveness of Korean universities. Representing Ajou University’s international students, two graduate students and seven undergraduate students participated in the event, sharing their experiences about campus life, academic studies, and difficulties faced. Participants included GKS scholarship recipient Vats Animesh (Graduate School of International Studies, India) and Bayeh Rediet Sahlu (Master’s Program in Medicine, Ethiopia), along with: ▲ Khit Min (Department of Software)▲ Erdenesaikhan Amuujin (Department of Software) ▲ Hasegawa Reo (Department of Software) ▲ Pyae Phyo Thu (Department of Culture and Contents) ▲ Uzun Kubra (Department of Culture and Contents) ▲ Nguyen Thi Lan (Department of Business) ▲ Choo Shue Wen (Department of Korean Language and Literature). This semester, a total of 2,981 international students are enrolled at Ajou University. Of these, 1,505 are in degree programs, of which the majority are in the undergraduate program or the Master’s Degree program at the Graduate School of International Studies, while 1,476 are pursuing non-degree programs such as Korean language studies. Ajou University has established various support programs to assist the growing number of international students in adapting to campus life and succeeding academically. These include: ▲ A dedicated orientation program for new international students ▲ The International Student Council ▲ Specialized counseling support programs ▲ Career development and internship support programs. Additionally, to strengthen Korean language education for international students, the Global Liberal Arts Division offers various courses and extracurricular activities, such as: ▲ Korean Language Buddy Program ▲ Korean Writing Contest ▲ Korean Language Social Gatherings ▲ Writing Clinics. The Ministry of Education is hosting the “Together Tea Talks,” where the Minister personally visits educational institutions to have conversations with students and staff. This event was held as part of the 74th session of the "Together Tea Talks.“ Our international graduate student Vats Animesh speaks during the roundtable Student Uzun Kubra (Department of Culture and Contents, Türkiye) shares her thoughts

Meeting with Myanmar Students Affected by Earthquake, Exploring Support Measures

A meeting was held between President Ki-Joo Choi and Myanmar students currently enrolled at Ajou University, aiming to support their stability and explore ways the university can assist, in light of the recent earthquake that caused significant damage in Myanmar. On the morning of April 9, six Myanmar students met with President Choi at the President’s Office in Yulgok Hall. Lee Seok-Won, Vice President of International Affairs, and Choi Jeong-Young(Catherine), Director of the Undergraduate International Admissions Team, also attended the meeting. The attendees included five undergraduate students, such as Aye Nyein Thet Naing (Business Administration major), and one student currently enrolled in the Korean Language Program. Representing the Ajou community, President Choi listened to the students as they shared the situations of their families and friends affected by the disaster, offering words of comfort. He also discussed possible support measures the university could provide. On March 28, a powerful 7.7-magnitude earthquake struck near Mandalay, Myanmar’s second-largest city, causing significant loss of life and property damage. Currently, a total of 351 Myanmar students are studying at Ajou University, including 155 in degree programs (undergraduate and graduate) and 196 in non-degree Korean language programs. The university has been monitoring the situation closely and has identified more than 20 students who reported being directly affected by the earthquake. Meanwhile, Ajou University has launched a fundraising campaign to support earthquake relief efforts in Myanmar. The campaign, which began on April 7, ran until April 14, and contributions were made through the Ajou University portal website.